Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - I. Chemical formulation and reaction mechanisms

Tseng, W. T.W. T.TsengLo, C. H.C. H.LoLee, S. C.S. C.Lee2019-04-292019-04-292001https://scholars.lib.ntu.edu.tw/handle/123456789/406009Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - I. Chemical formulation and reaction mechanismsjournal article10.1149/1.1359200WOS:000168421200025