Ren, F.F.RenMINGHWEI HONGMannaerts, J.P.J.P.MannaertsLothian, J.R.J.R.LothianCho, A.Y.A.Y.Cho2019-12-272019-12-271997https://scholars.lib.ntu.edu.tw/handle/123456789/443493Wet chemical and plasma etching of Ga<inf>2</inf>O<inf>3</inf>(Gd<inf>2</inf>O<inf>3</inf>)journal article10.1149/1.18379292-s2.0-0031233571https://www.scopus.com/inward/record.uri?eid=2-s2.0-0031233571&doi=10.1149%2f1.1837929&partnerID=40&md5=0b1067f0bf8e06df93ea8006ab7194b4