Erratum: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects (Journal of Micro/ Nanolithography, MEMS, and MOEMS (2011) 10 (013004))

Ng P.C.WKUEN-YU TSAILee Y.-MWang F.-MJIA-HAN LIChen A.C.2023-06-092023-06-09201119325150https://www.scopus.com/inward/record.uri?eid=2-s2.0-80455141611&doi=10.1117%2f1.3576188&partnerID=40&md5=547fb5697c575b9b5b2f0382fc59840chttps://scholars.lib.ntu.edu.tw/handle/123456789/632452Erratum: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects (Journal of Micro/ Nanolithography, MEMS, and MOEMS (2011) 10 (013004))corrigendum10.1117/1.35761882-s2.0-80455141611