Microstructures and optoelectronic properties of Cu<inf>x</inf>O films deposited by high-power impulse magnetron sputtering

Sun, H.H.SunWen, C.-K.C.-K.WenChen, S.-C.S.-C.ChenChuang, T.-H.T.-H.ChuangArab Pour Yazdi, M.M.Arab Pour YazdiSanchette, F.F.SanchetteBillard, A.A.BillardTUNG-HAN CHUANG2020-05-122020-05-122016https://scholars.lib.ntu.edu.tw/handle/123456789/491965Microstructures and optoelectronic properties of Cu<inf>x</inf>O films deposited by high-power impulse magnetron sputteringjournal article10.1016/j.jallcom.2016.07.2082-s2.0-84979938873https://www.scopus.com/inward/record.uri?eid=2-s2.0-84979938873&doi=10.1016%2fj.jallcom.2016.07.208&partnerID=40&md5=f6d624df73754aaa7cb4b1c25a2ce594