Oxidation of silicon nitride prepared by plasma-enhanced chemical vapor deposition at low temperature

Liao, W.-S.W.-S.LiaoLin, C.-H.C.-H.LinSI-CHEN LEE2020-06-112020-06-111994https://scholars.lib.ntu.edu.tw/handle/123456789/498749[SDGs]SDG6Oxidation of silicon nitride prepared by plasma-enhanced chemical vapor deposition at low temperaturejournal article10.1063/1.1127722-s2.0-29844457849https://www.scopus.com/inward/record.uri?eid=2-s2.0-29844457849&doi=10.1063%2f1.112772&partnerID=40&md5=1a6f89ba3b8e338e3d7bc5f74e537c58