Abnormal redeposition of silicate from Si 3 N 4 etching onto SiO 2 surfaces in flash memory manufacturing

Teng, K.-W.K.-W.TengTu, S.-H.S.-H.TuHu, S.-W.S.-W.HuHuang, Y.-X.Y.-X.HuangSheng, Y.-J.Y.-J.ShengTsao, H.-K.H.-K.TsaoYU-JANE SHENG2021-02-042021-02-042020https://www.scopus.com/inward/record.url?eid=2-s2.0-85074200789&partnerID=40&md5=84be623963afbe38b8d2f7c176c0547ahttps://scholars.lib.ntu.edu.tw/handle/123456789/546562[SDGs]SDG9Abnormal redeposition of silicate from Si 3 N 4 etching onto SiO 2 surfaces in flash memory manufacturingjournal article10.1007/s10853-019-04119-x2-s2.0-85074200789