Optoelectronic properties of Cu<inf>3</inf>N thin films deposited by reactive magnetron sputtering and its diode rectification characteristics

Chen, S.-C.S.-C.ChenHuang, S.-Y.S.-Y.HuangSakalley, S.S.SakalleyPaliwal, A.A.PaliwalChen, Y.-H.Y.-H.ChenLiao, M.-H.M.-H.LiaoSun, H.H.SunBiring, S.S.BiringMING-HAN LIAO2020-01-132020-01-132019https://scholars.lib.ntu.edu.tw/handle/123456789/447941Optoelectronic properties of Cu<inf>3</inf>N thin films deposited by reactive magnetron sputtering and its diode rectification characteristicsjournal article10.1016/j.jallcom.2019.02.2682-s2.0-85062629566https://www.scopus.com/inward/record.uri?eid=2-s2.0-85062629566&doi=10.1016%2fj.jallcom.2019.02.268&partnerID=40&md5=f352721d0681c6ff6d235ad926c7c70a