Tsai, M.-Y.M.-Y.TsaiChen, S.-T.S.-T.ChenLiao, Y.-S.Y.-S.LiaoSung, J.J.SungYUNN-SHIUAN LIAO2020-01-132020-01-132009https://scholars.lib.ntu.edu.tw/handle/123456789/448649Novel diamond conditioner dressing characteristics of CMP polishing padjournal article10.1016/j.ijmachtools.2009.03.0012-s2.0-67349286962https://www.scopus.com/inward/record.uri?eid=2-s2.0-67349286962&doi=10.1016%2fj.ijmachtools.2009.03.001&partnerID=40&md5=c3cb9ae3e4e479df4ece029703046db4