Thin-film deposition modeling of hydrogenated amorphous silicon in the afterglow of argon plasma

Chau, S.W.S.W.ChauPham, Q.T.Q.T.PhamNguyen, M.N.M.N.NguyenSHIU-WU CHAU2020-01-172020-01-172013https://scholars.lib.ntu.edu.tw/handle/123456789/451604Thin-film deposition modeling of hydrogenated amorphous silicon in the afterglow of argon plasmajournal article10.1016/j.compfluid.2013.09.0212-s2.0-84888199875https://www.scopus.com/inward/record.uri?eid=2-s2.0-84888199875&doi=10.1016%2fj.compfluid.2013.09.021&partnerID=40&md5=37efd0ea886d975ed466982df8723698