Model-based proximity effect correction for helium ion beam lithography

Chien-Lin LeeSheng-Wei ChienKuen-Yu Tsai*KUEN-YU TSAI2019-10-312019-10-3120180277786xhttps://scholars.lib.ntu.edu.tw/handle/123456789/429891Model-based proximity effect correction for helium ion beam lithographyconference paper10.1117/12.22976912-s2.0-85050203571