Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithography

Philip C. W. NgSheng-Wei ChienBo-Sen ChangKuen-Yu TsaiYi-Chang LuKUEN-YU TSAI2018-09-102018-09-102010-11http://scholars.lib.ntu.edu.tw/handle/123456789/359320Impact of process effects correction strategies on critical dimension and electrical characteristics variabilities in extreme ultraviolet lithographyconference paper