Nanometer Scale Focused Ion Beam Vacuum Lithography Using an Ultrathin Native Oxide Resist

王玉麟Harriott, L. R.L. R.HarriottTemkin, H.H.TemkinChu, C. H.C. H.ChuHseih, Y. F.Y. F.HseihHamm, R. A.R. A.HammPanish, M. B.M. B.PanishWade, H. H.H. H.WadeWang, Yuh-LinYuh-LinWang2009-01-232018-06-282009-01-232018-06-281991http://ntur.lib.ntu.edu.tw//handle/246246/110864en-USNanometer Scale Focused Ion Beam Vacuum Lithography Using an Ultrathin Native Oxide Resistconference paper