Nanometer thick single crystal Y2 O3 films epitaxially grown on Si (111) with structures approaching perfection

Nieh, C.W.C.W.NiehLee, Y.J.Y.J.LeeLee, W.C.W.C.LeeYang, Z.K.Z.K.YangKortan, A.R.A.R.KortanMINGHWEI HONGKwo, J.J.KwoHsu, C.-H.C.-H.Hsu2019-12-272019-12-272008https://scholars.lib.ntu.edu.tw/handle/123456789/443428Nanometer thick single crystal Y2 O3 films epitaxially grown on Si (111) with structures approaching perfectionjournal article10.1063/1.28839392-s2.0-39349111101https://www.scopus.com/inward/record.uri?eid=2-s2.0-39349111101&doi=10.1063%2f1.2883939&partnerID=40&md5=0c4135eac4c1626a89fbf63e1e766534