Computer-Aided Design on the VLSI 45-Degree Mask Compaction

馮武雄楊維楨Hsieh, M. Y.M. Y.HsiehFeng, Wu-ShiungWu-ShiungFengYang, Wei-TzenWei-TzenYang2009-02-042018-07-062009-02-042018-07-061993http://ntur.lib.ntu.edu.tw//handle/246246/121269en-USComputer-Aided Design on the VLSI 45-Degree Mask Compactionconference paper