Abbe-PCA-SMO: Microlithography source and mask optimization based on Abbe-PCA

Chang, S.-J.S.-J.ChangChen, C.C.P.C.C.P.ChenMelvin III, L.S.L.S.Melvin IIICHUNG-PING CHEN2020-06-112020-06-112009https://scholars.lib.ntu.edu.tw/handle/123456789/501079Abbe-PCA-SMO: Microlithography source and mask optimization based on Abbe-PCAconference paper10.1117/12.8376862-s2.0-77952063538https://www.scopus.com/inward/record.uri?eid=2-s2.0-77952063538&doi=10.1117%2f12.837686&partnerID=40&md5=50d39c255cb5424fb9b391d650e179cc