Phase masks fabricated by interferometric lithography for working in 248 nm wavelength

Cheng, W.C.W.C.ChengWang, L.A.L.A.WangLON A. WANG2020-06-042020-06-042003https://scholars.lib.ntu.edu.tw/handle/123456789/497268[SDGs]SDG7Phase masks fabricated by interferometric lithography for working in 248 nm wavelengthconference paper10.1016/S0167-9317(03)00060-12-s2.0-0038697386https://www.scopus.com/inward/record.uri?eid=2-s2.0-0038697386&doi=10.1016%2fS0167-9317%2803%2900060-1&partnerID=40&md5=73f09b7aae6ad9024bb006012aa2d50d