Accelerating the oxidation rate of AlN substrate through the addition of water vapor

Yeh, C.-T.C.-T.YehTuan, W.-H.W.-H.TuanWEI-HSING TUAN2020-05-122020-05-122017https://scholars.lib.ntu.edu.tw/handle/123456789/492142Accelerating the oxidation rate of AlN substrate through the addition of water vaporjournal article10.1016/j.jascer.2017.08.0012-s2.0-85028458415https://www.scopus.com/inward/record.uri?eid=2-s2.0-85028458415&doi=10.1016%2fj.jascer.2017.08.001&partnerID=40&md5=efc650611a8d88f3fcbf29d14904abb9