Chen, H.L.H.L.ChenHsu, C.K.C.K.HsuChen, B.C.B.C.ChenKo, F.H.F.H.KoYang, J.Y.J.Y.YangHuang, T.Y.T.Y.HuangChu, T.C.T.C.ChuHSUEN-LI CHEN2020-05-122020-05-122001https://scholars.lib.ntu.edu.tw/handle/123456789/491404Studies of chemically amplified deep UV resists for electron beam lithography applicationsconference paper10.1117/12.4367052-s2.0-0034757243https://www.scopus.com/inward/record.uri?eid=2-s2.0-0034757243&doi=10.1117%2f12.436705&partnerID=40&md5=6594ff1d34ae42f803dc3d28418e7d55