Comparison of microstructural and optoelectronic properties of NiO:Cu thin films deposited by ion-beam assisted rf sputtering in different gas atmospheres

Wen, C.-K.C.-K.WenXin, Y.-Q.Y.-Q.XinChen, S.-C.S.-C.ChenChuang, T.-H.T.-H.ChuangChen, P.-J.P.-J.ChenSun, H.H.SunTUNG-HAN CHUANG2020-05-122020-05-122019https://scholars.lib.ntu.edu.tw/handle/123456789/491947[SDGs]SDG7Comparison of microstructural and optoelectronic properties of NiO:Cu thin films deposited by ion-beam assisted rf sputtering in different gas atmospheresjournal article10.1016/j.tsf.2019.03.0182-s2.0-85063474499https://www.scopus.com/inward/record.uri?eid=2-s2.0-85063474499&doi=10.1016%2fj.tsf.2019.03.018&partnerID=40&md5=53d7a95ad3ec7f78e58aa882b0db971c