Bonding Characterization and Nano-indentation Study of Amorphous SiCxNy Films with and without Hydrogen Incorporation

H. C. LoJ.-J. WuC. Y. WenT. S. WongS. T. LinK. H. ChenL. C. Chen2020-06-202020-06-20200109259635https://scholars.lib.ntu.edu.tw/handle/123456789/503909Bonding Characterization and Nano-indentation Study of Amorphous SiCxNy Films with and without Hydrogen Incorporationjournal article10.1016/S0925-9635(01)00421-6