Fabrication of antireflection structures on flat and curved substrates by interference lithography and nanoimprint technique

Lee, C.-T.C.-T.LeeChen, Y.-P.Y.-P.ChenChang, J.-H.J.-H.ChangLON A. WANG2020-06-042020-06-042007https://scholars.lib.ntu.edu.tw/handle/123456789/497259[SDGs]SDG11Fabrication of antireflection structures on flat and curved substrates by interference lithography and nanoimprint techniqueconference paper10.1109/IMNC.2007.44561452-s2.0-47349134180https://www.scopus.com/inward/record.uri?eid=2-s2.0-47349134180&doi=10.1109%2fIMNC.2007.4456145&partnerID=40&md5=ba5d6019240a808bdb9f8cfc424bed3e