Recrystallized parylene as a mask for silicon chemical etching

Lo, H.-W.H.-W.LoKuo, W.-C.W.-C.KuoYang, Y.-J.Y.-J.YangTai, Y.-C.Y.-C.TaiYAO-JOE YANG2020-01-132020-01-132008https://scholars.lib.ntu.edu.tw/handle/123456789/448541Recrystallized parylene as a mask for silicon chemical etchingconference paper10.1109/NEMS.2008.44844642-s2.0-50249154909https://www.scopus.com/inward/record.uri?eid=2-s2.0-50249154909&doi=10.1109%2fNEMS.2008.4484464&partnerID=40&md5=c5c9c6654adae2c72f9c9a7c7063489c