Lee, F.-Y.F.-Y.LeeWu, Z.-Z.Z.-Z.WuKao, L.-C.L.-C.KaoChang, F.-M.F.-M.ChangChen, S.-W.S.-W.ChenJangjian, S.-K.S.-K.JangjianCheng, H.-Y.H.-Y.ChengChen, W.-L.W.-L.ChenChang, Y.-M.Y.-M.ChangLo, K.Y.K.Y.Lo2020-06-112020-06-11201720452322https://scholars.lib.ntu.edu.tw/handle/123456789/501525The chemical states and atomic structure evolution of ultralow-energy high-dose Boron implanted Si(110) via laser annealingjournal article10.1038/s41598-017-13415-y