Cheng, W. C.W. C.ChengWang, L. A.L. A.WangHsieh, C. Y.C. Y.Hsieh2009-03-252018-07-062009-03-252018-07-062003http://ntur.lib.ntu.edu.tw//handle/246246/148195application/pdf707989 bytesapplication/pdfen-USPhase masks fabricated by interferometric lithography for working in 248 nm wavelengthjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/148195/1/45.pdf