Interfacial reactions of rf-sputtered TiNi thin films on (100) silicon with a SiN diffusion barrier

Wu, S.K.S.K.WuSu, J.J.J.J.SuWang, J.Y.J.Y.WangSHYI-KAAN WU2018-09-102018-09-102004http://www.scopus.com/inward/record.url?eid=2-s2.0-16544384874&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/307435Interfacial reactions of rf-sputtered TiNi thin films on (100) silicon with a SiN diffusion barrierjournal article10.1080/14786430310001646745