Rapid thermal postoxidation anneal engineering in thin gate oxides with al gates

Chen, C.-Y.C.-Y.ChenJeng, M.-J.M.-J.JengHwu, J.-G.J.-G.HwuJENN-GWO HWU2018-09-102018-09-101998http://www.scopus.com/inward/record.url?eid=2-s2.0-0031647284&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/338631[SDGs]SDG6Rapid thermal postoxidation anneal engineering in thin gate oxides with al gatesjournal article10.1109/16.658838