Simulation of boron effects on OISF-ring dynamics for Czochralski silicon growth: a comparative study

Huang, L. I.L. I.HuangLee, P. C.P. C.LeeHsieh, C. K.C. K.HsiehShu, W. C.W. C.ShuCHUNG-WEN LAN2008-12-032018-06-282008-12-032018-06-282004https://www.scopus.com/record/display.uri?eid=2-s2.0-2342573658&origin=resultslist&sort=plf-f&src=s&sid=d16c55a7fbcf5d0933ccaf22e51d4208&sot=b&sdt=b&s=TITLE-ABS-KEY%28Simulation+of+boron+effects+on+OISF-ring+dynamics+for+Czochralski+silicon+growth%3A+a+comparative+study%29&sl=116&sessionSearchId=d16c55a7fbcf5d0933ccaf22e51d4208&relpos=0application/pdf379560 bytesapplication/pdfen-USSimulation of boron effects on OISF-ring dynamics for Czochralski silicon growth: a comparative studyjournal article10.1016/j.jcrysgro.2004.02.0942-s2.0-2342573658WOS:000221489900019http://ntur.lib.ntu.edu.tw/bitstream/246246/87477/1/41.pdf