Deposition of osmium thin films using pyrazolate complexes as CVD source reagents

Chi, Y.Y.ChiYu, H.-L.H.-L.YuChing, W.-L.W.-L.ChingLiu, C.-S.C.-S.LiuChen, Y.-L.Y.-L.ChenChou, T.-Y.T.-Y.ChouSHIE-MING PENGLee, G.-H.G.-H.Lee2018-09-102018-09-102002http://www.scopus.com/inward/record.url?eid=2-s2.0-0036096259&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/297464Deposition of osmium thin films using pyrazolate complexes as CVD source reagentsjournal article10.1039/b109150f2-s2.0-0036096259WOS:000175143000025