Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2006 | Interfacial self-cleaning in atomic layer deposition of HfO<inf>2</inf> gate dielectric on In<inf>0.15</inf>Ga<inf>0.85</inf>As | Chang, C.-H.; Chiou, Y.-K.; Chang, Y.-C.; Lee, K.-Y.; Lin, T.-D.; Wu, T.-B.; MINGHWEI HONG ; Kwo, J. | Applied Physics Letters |