公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2018 | Provably good max–min-m-neighbor-TSP-based subfield scheduling for electron-beam photomask fabrication | Lin Z.-W; Fang S.-Y; Chang Y.-W; Rao W.-C; CHIEH-HSIUNG KUAN ; Chang, Y.-W. | IEEE Transactions on Very Large Scale Integration (VLSI) Systems | 2 | 2 |