Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2018 | Provably good max–min-m-neighbor-TSP-based subfield scheduling for electron-beam photomask fabrication | Lin Z.-W; Fang S.-Y; Chang Y.-W; Rao W.-C; CHIEH-HSIUNG KUAN ; Chang, Y.-W. | IEEE Transactions on Very Large Scale Integration (VLSI) Systems | 2 | 2 |