Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2009 | The RF characteristics of micromachined coplanar waveguide in 0.13 μm CMOS technology by CMOS compatible ICP dry etching | Wang, T.; Lu, S.-S.; Lin, Y.-S.; Juang, Y.-Z.; Huang, G.-W.; SHEY-SHI LU | Microwave and Optical Technology Letters | 1 | 1 |