Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
---|---|---|---|---|---|---|
2001 | Studies of chemically amplified deep UV resists for electron beam lithography applications | Chen, H.L.; Hsu, C.K.; Chen, B.C.; Ko, F.H.; Yang, J.Y.; Huang, T.Y.; Chu, T.C.; HSUEN-LI CHEN | Proceedings of SPIE - The International Society for Optical Engineering | |||
2001 | Thermal flow and chemical shrink techniques for sub-100 nm contact hole fabrication in electron beam lithography | Chen, H.L.; Ko, F.H.; Li, L.S.; Hsu, C.K.; Chen, B.C.; Chu, T.C.; Huang, T.Y.; HSUEN-LI CHEN | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | |||
2002 | Thermal-flow techniques for sub-35 nm contact-hole fabrication in electron-beam lithography | Chen, H.L.; Chen, C.H.; Ko, F.H.; Chu, T.C.; Pan, C.T.; Lin, H.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |