Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2004 | Electrical and optical reliability improvement of HfO2 gate dielectric by deuterium and hydrogen incorporation | Yu C.-Y; Chen T.C; Lee M.H; Huang S.-H; Lee L.S; CHEE-WEE LIU | Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA | 1 |