Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2003 | Porous materials with ultra-low dielectric constant as antireflective coating layers for F 2 and ArF lithography | Chen, H.L.; Tu, C.W.; Wang, T.J.; Liu, P.T.; Ko, F.H.; Chung, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 |