公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2006 | Interfacial self-cleaning in atomic layer deposition of HfO 2 gate dielectric on In 0.15 Ga 0.85 As | Chang, CH; Chiou, YK; Chang, YC; Lee, KY; Lin, TD; Wu, TB; Hong, M; Kwo, J; MINGHWEI HONG | Applied Physics Letters | | | |
2006 | Molecular beam epitaxy grown template for subsequent atomic layer deposition of high k dielectrics | Lee, KY; Lee, WC; Lee, YJ; Huang, ML; Chang, CH; Wu, TB; Hong, M; Kwo, J; MINGHWEI HONG | Applied Physics Letters | | | |
2005 | Surface passivation of III-V compound semiconductors using atomic-layer-deposition-grown Al̃ 2Õ 3 | Huang, ML; Chang, YC; Chang, CH; Lee, YJ; Chang, P; Kwo, J; Wu, TB; Hong, M; MINGHWEI HONG | Applied Physics Letters | | | |