Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2011 | Integration of block copolymer directed self assembly with 193i lithography toward fabrication of nanowire MOSFETs | C. Lin; P. F. Nealey; T.-H. Chang; Z. Ma; A. K. Raub; S. R. J. Brueck; E. Han; P. Gopalan; TZU-HSUAN CHANG | Proceedings of SPIE Microlithography |