公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2009 | A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography | Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | The 53th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication 2009 | |||
2008 | A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography | Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI | Lithography Asia 2008 - Proc. SPIE | 5 | 0 | |
2015 | Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography | Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi; Yu-Tian Shen; KUEN-YU TSAI | Japanese Journal of Applied Physics | 0 | 0 | |
2009 | Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability | Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | Lithography Asia 2009 | |||
2017 | Fabrication of metrology test structures with helium ion beam direct write | Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; JIA-HAN LI | Advanced Lithography 2017 - Proceedings of SPIE | 4 | 0 | |
2006 | Feedback control of piezo-based nanopositioning systems for semiconductor manufacturing | Chun-Hung Liu; Yea-Chin Yeh; Kuen-Yu Tsai; Jia-Yush Yen; Arthur Tay; Jyh-Fa Lee; KUEN-YU TSAI | IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing | |||
2006 | Identifications of the PZT Actuated Novel Optical Scanning System | Yea-Chin Yeh; Chun-Hung Liu; Kuen-Yu Tsai; Yu-Chen Kung; Jia-Yush Yen; Jyh-Fa Lee; KUEN-YU TSAI | IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing | |||
2013 | Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography | Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Vacuum Science & Technology B | 8 | 7 | |
2010 | Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography | Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication | |||
2014 | Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly | Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI | Advanced Lithography 2014 - Proc. SPIE | 1 | 0 | |
2011 | Lithography-patterning-fidelity-aware electron-optical system design optimization | Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Vacuum Science and Technology B | 1 | 5 | |
2016 | Method and System for Establishing Parametric Model | Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI | ||||
0 | Method and System for Establishing Parametric Model (參數化模型的建立方法及系統) | Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI | ||||
2014 | Method for Compensating Proximity Effect of Particle Beam Lithography Process (粒子束微影程序鄰近效應之補償方法) | Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI | ||||
2013 | Method for Compensating Proximity Effects of Particle Beam Lithography Processes | Kuen-Yu Tsai; Chun-Hung Liu; Chooi-Wan Ng; Pei-Lin Tien; KUEN-YU TSAI | ||||
2010 | Model-based proximity effect correction for electron-beam direct-write lithography | Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng; Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI | Advanced Lithography 2010 -- Proc. SPIE 7637, Alternative Lithographic Technologies II | 7 | 0 | |
2012 | New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints | Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 0 | 5 | |
2012 | New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography | Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 0 | 8 | |
2009 | Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability | Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI | Advanced Lithography 2009 |