公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2010 | 10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV | Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI | The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication |