Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2022 | Atomic layer annealing for modulation of the work function of TiN metal gate for n-type MOS devices | Wang C.-Y; Chou C.-Y; Shiue H.-F; Chen H.-Y; Ling C.-H; Shyue J.-J; Chen M.-J.; MIIN-JANG CHEN | Applied Surface Science | |||
2020 | Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks | Wang C.-I; Chang T.-J; Yin Y.-T; Jiang Y.-S; Shyue J.-J; Chen M.-J.; MIIN-JANG CHEN | ACS Applied Electronic Materials | |||
2021 | Atomic layer deposited TiN capping layer for sub-10 nm ferroelectric Hf0.5Zr0.5O2 with large remnant polarization and low thermal budget | Wang C.-I; Wang C.-Y; Chang T.-J; Jiang Y.-S; Shyue J.-J; HSIN-CHIH LIN ; MIIN-JANG CHEN | Applied Surface Science | 5 | 4 | |
2021 | Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride | Chou C.-Y; Lee W.-H; Chuu C.-P; Chen T.-A; Hou C.-H; Yin Y.-T; Wang T.-Y; Shyue J.-J; Li L.-J; Chen M.-J.; MIIN-JANG CHEN | Chemistry of Materials | |||
2021 | Heterocyclic-Additive-Activated Dinuclear Dysprosium Electrocatalysts for Heterogeneous Water Oxidation | Tung C.-W; Tso C.-H; Chen B.-Y; Chu H; Hou C.-H; Chen H.-C; Chang M.-C; Shyue J.-J; Lin P.-H; HAO MING CHEN ; MU-CHIEH CHANG | Inorganic Chemistry | 5 | 4 | |
2020 | In situ unraveling of the effect of the dynamic chemical state on selective CO2reduction upon zinc electrocatalysts | Chen T.-L; Chen H.-C; Huang Y.-P; Lin S.-C; Hou C.-H; Tan H.-Y; Tung C.-W; Chan T.-S; Shyue J.-J; HAO MING CHEN | Nanoscale | 20 | ||
2021 | Sandwich Evaporation-Solvent Annealing Fabrication of Highly Crystalline MAPbIxCl3- xPerovskite Solar Cells | Kuan C.-H; Kuo P.-T; Shen H.-H; Hou C.-H; Shyue J.-J; Huang L.-J; CHING-FUH LIN | ACS Applied Materials and Interfaces | 5 | 5 | |
2022 | Supramolecular gating of TADF process in self-assembled nano-spheres for high-resolution OLED applications | Hsieh Y.-Y; S?nchez R.S; Raffy G; Shyue J.-J; Hirsch L; Del Guerzo A; KEN-TSUNG WONG ; Bassani D.M. | Chemical Communications | 2 | 2 |