Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2010 | Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system | Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI | International Microprocesses and Nanotechnology Conference 2010 |