第 1 到 4 筆結果,共 4 筆。
公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 | |
---|---|---|---|---|---|---|---|
1 | 2012 | Graph-based subfield scheduling for electron-beam photomask fabrication | Fang, S.-Y.; Chen, W.-Y.; Chang, Y.-W.; YAO-WEN CHANG | International Symposium on Physical Design | 3 | 0 | |
2 | 2012 | Native-conflict and stitch-aware wire perturbation for double patterning technology | Fang, S.-Y.; Chen, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | 20 | 16 | |
3 | 2012 | A novel layout decomposition algorithm for triple patterning lithography | Fang, S.-Y.; Chang, Y.-W.; Chen, W.-Y.; YAO-WEN CHANG | Design Automation Conference | 47 | 0 | |
4 | 2012 | Simultaneous flare level and flare variation minimization with dummification in EUVL | Fang, S.-Y.; Chang, Y.-W.; YAO-WEN CHANG | Design Automation Conference | 14 | 0 |