https://scholars.lib.ntu.edu.tw/handle/123456789/155863
Title: | Thermal stability of Si/Si1 – x – yGexCy/Si quantum wells grown by rapid thermal chemical vapor deposition | Authors: | Liu, C. W. Tseng, Y. D. Chern, M. Y. Chang, C. L. Sturm, J. C. LiuCW |
Issue Date: | 1999 | Journal Volume: | 85 | Journal Issue: | 4 | Start page/Pages: | - | Source: | Journal of Applied Physics | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/148144 |
Appears in Collections: | 電機工程學系 |
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