https://scholars.lib.ntu.edu.tw/handle/123456789/292807
Title: | New CVD source reagents for osmium thin film deposition | Authors: | Yu, H.-L. Chi, Y. Liu, C.-S. SHIE-MING PENG Lee, G.-H. |
Issue Date: | 2001 | Journal Volume: | 7 | Journal Issue: | 6 | Start page/Pages: | 245-248 | Source: | Chemical Vapor Deposition | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0001503617&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/292807 |
DOI: | 10.1002/1521-3862(200111)7:6<245 |
Appears in Collections: | 化學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.