https://scholars.lib.ntu.edu.tw/handle/123456789/340166
Title: | Achieving 1 nm capacitive effective thickness in atomic layer deposited HfO 2 on In 0.53 Ga 0.47 As | Authors: | Lee, KY Lee, YJ Chang, P Huang, ML Chang, YC Hong, M Kwo, J MINGHWEI HONG |
Issue Date: | 2008 | Journal Volume: | 92 | Start page/Pages: | 252908 | Source: | Applied Physics Letter | URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/340166 |
Appears in Collections: | 應用物理研究所 |
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