https://scholars.lib.ntu.edu.tw/handle/123456789/340174
Title: | 1 nm equivalent oxide thickness in Ga 2 O 3 (Gd 2 O 3)/In 0.2 Ga 0.8 As metal-oxide-semiconductor capacitors | Authors: | Shiu, KH Chiang, TH Chang, P Tung, LT MINGHWEI HONG Kwo, J Tsai, W |
Issue Date: | 2008 | Journal Volume: | 92 | Journal Issue: | 17 | Source: | Applied Physics Letters | URI: | http://scholars.lib.ntu.edu.tw/handle/123456789/340174 |
Appears in Collections: | 應用物理研究所 |
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