https://scholars.lib.ntu.edu.tw/handle/123456789/429858
Title: | Proximity effect correction in electron-beam lithography based on computation of critical-development time with swarm intelligence | Authors: | ChunNien Li-ChengChang Jia-HaoYe Vin-CentSu Chao-HsinWu Chieh-HsiungKuan CHAO-HSIN WU |
Issue Date: | 2017 | Journal Volume: | 35 | Journal Issue: | 5 | Start page/Pages: | 235-249 | Source: | Journal of Vacuum Science & Technology B | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/429858 | ISSN: | 21662746 | DOI: | 10.1116/1.5001686 |
Appears in Collections: | 電機工程學系 |
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