https://scholars.lib.ntu.edu.tw/handle/123456789/448162
Title: | Application of an innovative process technology for phase shift mask in near-field phase shift lithography | Authors: | Hsu, H.-Y. Weng, Y.-J. Huang, J.-T. Yang, S.-Y. SEN-YEU YANG |
Issue Date: | 2012 | Journal Volume: | 13 | Start page/Pages: | 73-79 | Source: | Advanced Science Letters | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/448162 | DOI: | 10.1166/asl.2012.3909 |
Appears in Collections: | 機械工程學系 |
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