https://scholars.lib.ntu.edu.tw/handle/123456789/491399
Title: | Low dielectric constant SILK films as bottom antireflective coating layers for both KrF and ArF lithography | Authors: | Chen, H.L. Ko, F.H. Chu, T.C. Cheng, H.C. Huang, T.Y. HSUEN-LI CHEN |
Issue Date: | 2001 | Start page/Pages: | 132-133 | Source: | 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/491399 | DOI: | 10.1109/IMNC.2001.984124 |
Appears in Collections: | 材料科學與工程學系 |
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