https://scholars.lib.ntu.edu.tw/handle/123456789/503975
Title: | 5nm ruthenium thin film as a directly plateable copper diffusion barrier | Authors: | T. N. Arunagiri Y. Zhang O. Chyan M. El-Bounani M. J. Kim C. T. Wu L. C. Chen K. H. Chen |
Issue Date: | 2005 | Publisher: | American Institute of Physics | Journal Volume: | 86 | Journal Issue: | 8 | Start page/Pages: | 083104-1 - 083104-3 | Source: | Applied Physics Letters | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/503975 | ISSN: | 00036951 | DOI: | https://doi.org/10.1063/1.1867560 |
Appears in Collections: | 凝態科學研究中心 |
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